Belgian research lab Imec has revealed test results from 20nm pitch metal lines patterned using a single-exposure of high NA (numerical aperture) EUV lithography. Top-down SEM pictures of 20nm pitch ...

imec, the research and innovation hub, has announced the first electrical test (e-test) results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography.

UMC will skip 20nm products and target 14 nm FinFET as its next technology node to catch up with foundry rivals Samsung and TSMC. Samsung started making 14nm FinFET chips earlier this year while TSMC ...